# TSMC and Samsung commit to adopting ASML’s High NA EUV lithography tools by 2030 — retained record

> Retained news record from news:datacenterdynamics.

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source: [news](https://highsignal.app/data/news) (news:datacenterdynamics)  published 2026-09-09 08:55 ingested 2026-09-09 11:00

[original source ↗](https://www.datacenterdynamics.com/en/news/tsmc-and-samsung-commit-to-adopting-asmls-high-na-euv-lithography-tools-by-2030/)

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document fetched 2026-09-09 13:51 · canonical https://datacenterdynamics.com/en/news/tsmc-and-samsung-commit-to-adopting-asmls-high-na-euv-lithography-tools-by-2030