# Elon Musk, Jensen Huang see China closing lithography gap by 2030 — retained record

> Retained news record from news:digg-verification:digitimes.com.

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source: [news](https://highsignal.app/data/news) (news:digg-verification:digitimes.com)  published 2026-10-03 09:01 ingested 2026-10-03 09:01

[original source ↗](https://www.digitimes.com/news/a20261002PD247/asml-elon-musk-jensen-huang-2030-euv.html)

## retained text



```
Credit: AFP
While ASML executives explore how to scale extreme ultraviolet (EUV) lithography output beyond 110 units by 2028, China is pursuing indigenous advanced lithography systems...
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document fetched 2026-10-03 09:33 · canonical https://digitimes.com/news/a20261002PD247/asml-elon-musk-jensen-huang-2030-euv.html